Laboratoire de Physique et Chimie de Nano-Objets
Institut National des Sciences Appliquées
135 avenue de Rangueil, 31077 TOULOUSE CEDEX 4 - FRANCE
Tél : 00 33 05 61 55 96 51 | Fax : (+33) (0)5 61 55 96 97
135 avenue de Rangueil, 31077 TOULOUSE CEDEX 4 - FRANCE
Tél : 00 33 05 61 55 96 51 | Fax : (+33) (0)5 61 55 96 97
Accueil du site > LPCNO > Équipes > Nanotech > Publications
Nanotech : publications de l equipe
publications classees par type annee2009
99% random telegraph signal-like noise in gold nanoparticle μ-stripes
J grisolia, B Viallet, C Amiens, S Baster, A S Cordan, Y Leroy, C Soldano, J Brugger, L Ressier
Nanotechnology , vol 20 355303 (2009)
J grisolia, B Viallet, C Amiens, S Baster, A S Cordan, Y Leroy, C Soldano, J Brugger, L Ressier
Nanotechnology , vol 20 355303 (2009)
How to Control AFM Nanoxerography for the Templated Monolayered Assembly of 2 nm Colloidal Gold Nanoparticles
Ressier L, Palleau E, Garcia C , Viau G, Viallet B
IEEE Transactrions on Nanotechnology 8, 487-491 (2009)
Ressier L, Palleau E, Garcia C , Viau G, Viallet B
IEEE Transactrions on Nanotechnology 8, 487-491 (2009)
2008
Combination of AFM, SKPFM and SIMS to study the electrochemical behavior of S-phase particles in A2024-T351
L. Lacroix, L. Ressier, C. Blanc et G. Mankowski
Journal of The Electrochemical Society, 155 (4), C131-C137 (2008)
L. Lacroix, L. Ressier, C. Blanc et G. Mankowski
Journal of The Electrochemical Society, 155 (4), C131-C137 (2008)
Combining Convective/Capillary Deposition and AFM Oxidation Lithography for Close-Packed Directed Assembly of Colloids
Ressier Laurence,Viallet Benoit, Beduer Amélie, Fabre Dimitri, Fabié Laure, Palleau Etienne, Dague Etienne
Langmuir, 24 (23), pp 13254–13257 (2008)
Ressier Laurence,Viallet Benoit, Beduer Amélie, Fabre Dimitri, Fabié Laure, Palleau Etienne, Dague Etienne
Langmuir, 24 (23), pp 13254–13257 (2008)
Electrostatic nanopatterning of PMMA by AFM charge writing for directed self-assembly
Ressier Laurence, Le Nader V
Nanotechnology , 19, 135301-135306 (2008)
Ressier Laurence, Le Nader V
Nanotechnology , 19, 135301-135306 (2008)
KFM detection of charges injected by AFM into a thin SiO2 layer containing Si nanocrystals
C. Dumas, L. Ressier and J. Grisolia, A. Arbouet, V. Paillard, G. BenAssayag and C. Bonafos, P. Normand
Microelectronic Engineering, 85, 2358-2361 (2008)
C. Dumas, L. Ressier and J. Grisolia, A. Arbouet, V. Paillard, G. BenAssayag and C. Bonafos, P. Normand
Microelectronic Engineering, 85, 2358-2361 (2008)
Nanostructured ZnO-based layers deposited by non reactive rf magnetron sputtering on ultra-thin SiO2/Si through a stencil mask
ABarnabe, M. Lalanne, L. Presmanes, Ph. Tailhades, C. Dumas, J. Grisolia, M. Naceur, A. Arbouet, V. Paillard, G. BenAssayag, M.A.F. van den Boogaart, J. Brugger and P. Normand
Thin Solid Films, sous presse
ABarnabe, M. Lalanne, L. Presmanes, Ph. Tailhades, C. Dumas, J. Grisolia, M. Naceur, A. Arbouet, V. Paillard, G. BenAssayag, M.A.F. van den Boogaart, J. Brugger and P. Normand
Thin Solid Films, sous presse
Optimization of the OMCVD process for iron and molybdenum supported nanoparticles elaboration from their carbonyl precursors
E. Lamouroux, M. Corrias, L. Ressier, Y. Kihn, P. Serp et P. Kalck
Chemical Vapor Deposition, 14, 275-278 (2008)
E. Lamouroux, M. Corrias, L. Ressier, Y. Kihn, P. Serp et P. Kalck
Chemical Vapor Deposition, 14, 275-278 (2008)
Silicon nanoparticles synthesized in SiO2 pockets by stencil-masked low-energy ion implantation and thermal annealing
J. Grisolia, C. Dumas, G. BenAssayag, C. Bonafos, S. Schamm, A. Arbouet, V. Paillard, M.A.F. Van den Boogaart, J. Brugger, P. Normand.
Superlattices and Microstructures, doi:10.1016/j.spmi.2007.12.013
J. Grisolia, C. Dumas, G. BenAssayag, C. Bonafos, S. Schamm, A. Arbouet, V. Paillard, M.A.F. Van den Boogaart, J. Brugger, P. Normand.
Superlattices and Microstructures, doi:10.1016/j.spmi.2007.12.013
Statistical study of the corrosion behavior of Al2CuMg intermetallics in AA2024-T351 by SKPFM
L. Lacroix, L. Ressier, C. Blanc et G. Mankowski
Journal of The Electrochemical Society, , 155 (1), C8-C15 (2008)
L. Lacroix, L. Ressier, C. Blanc et G. Mankowski
Journal of The Electrochemical Society, , 155 (1), C8-C15 (2008)
Stencil assisted reactive ion etching for micro and nano patterning
B. Viallet, J. Grisolia, L. Ressier, M.A.F.van den Boogaart, J.Brugger, T. Lebraud
Microelectronic Engineering, Microelectronic Engineering 85 (2008) pp. 1705-1708, doi:10.1016/j.mee.2008.04.027
B. Viallet, J. Grisolia, L. Ressier, M.A.F.van den Boogaart, J.Brugger, T. Lebraud
Microelectronic Engineering, Microelectronic Engineering 85 (2008) pp. 1705-1708, doi:10.1016/j.mee.2008.04.027
2007
Adhesion improvement of epoxy resist to a benzocyclobutene layer : Application to nanoimprint lithography
Benoit Viallet , E. Daran
Polymer Surface Modification : Relevance to Adhesion, Polymer Surface Modification : Relevance to Adhesion, Vol. 4, pp.231-240, Leiden, Boston
Benoit Viallet , E. Daran
Polymer Surface Modification : Relevance to Adhesion, Polymer Surface Modification : Relevance to Adhesion, Vol. 4, pp.231-240, Leiden, Boston
Chemical patterns of octadecyltrimethoxysilane monolayers for the selective deposition of nanoparticles on silicon substrate
L. Ressier*, B. Viallet, J. Grisolia and J.P. Peyrade,
ULTRA-MICROSCOPY, 107/10-11, 980–984 (2007)
L. Ressier*, B. Viallet, J. Grisolia and J.P. Peyrade,
ULTRA-MICROSCOPY, 107/10-11, 980–984 (2007)
Control of micro and nano-patterns of octadecyltrimethoxysilane monolayers using nano-imprint lithography and atmospheric chemical vapor deposition
L. Ressier, B. Viallet, C.Martin, J. Grisolia, J.P. Peyrade,
J. Vac. Sci. Technol. B, Vol. 25, No. 1, 17-20 Jan/Feb 2007.
L. Ressier, B. Viallet, C.Martin, J. Grisolia, J.P. Peyrade,
J. Vac. Sci. Technol. B, Vol. 25, No. 1, 17-20 Jan/Feb 2007.
Control of negative PMMA for the elaboration of planar electrodes separated by a sub-10nm gap
J. Grisolia, C. Martin, L. Ressier, J-P. Peyrade, B. Viallet, C. Vieu.
Journal of Nanoengineering and Nanosystems, DOI : 10.1243/17403499JNN58, Pages : 61-69, Issue : Volume 221, Number 2/2007.
J. Grisolia, C. Martin, L. Ressier, J-P. Peyrade, B. Viallet, C. Vieu.
Journal of Nanoengineering and Nanosystems, DOI : 10.1243/17403499JNN58, Pages : 61-69, Issue : Volume 221, Number 2/2007.
Fabrication of planar ferromagnetic electrodes separated by a sub-10nm gap using high resolution electron beam lithography with negative PMMA
J. Grisolia, L. Ressier, C. Martin, J. P. Peyrade, B. Viallet and C. Vieu
ULTRA-MICROSCOPY, 107/10-11, 985-988 (2007)
J. Grisolia, L. Ressier, C. Martin, J. P. Peyrade, B. Viallet and C. Vieu
ULTRA-MICROSCOPY, 107/10-11, 985-988 (2007)
Influence of the thickness of the tunnel layer on the charging characteristics of Si nanocrystals embedded in an ultra-thin SiO2 layer
C. Dumas, J. Grisolia, G. BenAssayag, C. Bonafos, S. Schamm, A. Claverie, A.Arbouet, M. Carrada, V. Paillard, M. Shalchian
Physica E, Physica E : Low-dimensional Systems and Nanostructures, 38 (2007) 80–84.
C. Dumas, J. Grisolia, G. BenAssayag, C. Bonafos, S. Schamm, A. Claverie, A.Arbouet, M. Carrada, V. Paillard, M. Shalchian
Physica E, Physica E : Low-dimensional Systems and Nanostructures, 38 (2007) 80–84.
Photoluminescence spectroscopy and transport electrical measurements reveal the quantized features of Si nanocrystals embedded in an ultra thin SiO2 layer
C.Dumas, J.Grisolia, M.Carrada, A.Arbouet, V.Paillard, G.Ben Assayag, C.Bonafos, S.Schamm, A.Claverie.
Phys. stat. sol. C, Phys. stat. sol. C 4, No. 2, 311– 315 (2007) / DOI 10.1002.
C.Dumas, J.Grisolia, M.Carrada, A.Arbouet, V.Paillard, G.Ben Assayag, C.Bonafos, S.Schamm, A.Claverie.
Phys. stat. sol. C, Phys. stat. sol. C 4, No. 2, 311– 315 (2007) / DOI 10.1002.
Selective deposition of gold nanoparticles using Van der Waals interactions
B. Viallet, 1, L. Ressier, J. Grisolia, J. P. Peyrade, R. Podgajny, C. Amiens, M. A. F. van den Boogaart, J. Brugger
Physica Status Solidi c, 4, No. 2 , 276(2007)
B. Viallet, 1, L. Ressier, J. Grisolia, J. P. Peyrade, R. Podgajny, C. Amiens, M. A. F. van den Boogaart, J. Brugger
Physica Status Solidi c, 4, No. 2 , 276(2007)
Synthesis of localized 2D-layers of silicon nanoparticles embedded in a SiO2 layer by a stencil-masked ultra-low energy ion implantation process
C.Dumas, J.Grisolia, L.Ressier, A.Arbouet, V.Paillard, G.Ben Assayag, A.Claverie, M.A.F.van den Boogaart, J.Brugger
Phys. Stat. Solidi A, 204, No. 2, 487–491 (2007) / DOI 10.1002.
C.Dumas, J.Grisolia, L.Ressier, A.Arbouet, V.Paillard, G.Ben Assayag, A.Claverie, M.A.F.van den Boogaart, J.Brugger
Phys. Stat. Solidi A, 204, No. 2, 487–491 (2007) / DOI 10.1002.
2006
Localisation of octadecyltrimethoxysilane self-assembled monolayers by combination of bottom-up and top-down approaches.
B. Viallet, C. Martin, L. Ressier, J. Grisolia, J-P Peyrade.
Silanes and Other Coupling Agents, Vol. 4, pp. 1–9, (2006).
B. Viallet, C. Martin, L. Ressier, J. Grisolia, J-P Peyrade.
Silanes and Other Coupling Agents, Vol. 4, pp. 1–9, (2006).
Photoluminescence characterization of few-nanocrystals electronic devices
A. Arbouet, M. Carrada, F. Demangeot, V. Paillarda, G. BenAssayag, C. Bonafos,A. Claverie, S. Schamm, C. Dumas, J. Grisolia, M.A.F. Van den Boogaart,J. Brugger, L. Doeswijk
Journal of Luminescence, 121 (2006) 340-343
A. Arbouet, M. Carrada, F. Demangeot, V. Paillarda, G. BenAssayag, C. Bonafos,A. Claverie, S. Schamm, C. Dumas, J. Grisolia, M.A.F. Van den Boogaart,J. Brugger, L. Doeswijk
Journal of Luminescence, 121 (2006) 340-343
“بررسي محل ذخيره بار در نانو كريستال هاي سيليكان سنتز شده به روش كاشت يوني با انرژي فوق العاده كم”
M. Shalchian, Alain Claverie, Jeremie Grisolia, Gerard BenAssayag, S. Atarodi.
ICEE, International conference on ICEE
M. Shalchian, Alain Claverie, Jeremie Grisolia, Gerard BenAssayag, S. Atarodi.
ICEE, International conference on ICEE
2005
Efficient aminosilane adhesion promoter for soft nanoimprint on GaAs
Pascal Gallo, Benoît Viallet, Emmanuelle Daran, and Chantal Fontaine
Appl. Phys. Lett., 87, 1 2005
Pascal Gallo, Benoît Viallet, Emmanuelle Daran, and Chantal Fontaine
Appl. Phys. Lett., 87, 1 2005
Electrical properties of nanocontacts on silicon nanoparticles embedded in thin SiO2 synthesized by ultralow energy ion implantation
G. Ben Assayag, M. Shalchian, J. Grisolia, C. Dumas,H. Coffin, S. M. Atarodi and A. Claverie
J. Vac. Sci. Technol. B, 23,6, 2821-2825 Nov/Dec 2005
G. Ben Assayag, M. Shalchian, J. Grisolia, C. Dumas,H. Coffin, S. M. Atarodi and A. Claverie
J. Vac. Sci. Technol. B, 23,6, 2821-2825 Nov/Dec 2005
Evolution of quantum electronic features with the size of silicon nanoparticles embedded in a SiO2 layer obtained by low energy ion implantation.
J. GRISOLIA, M. SHALCHIAN, G. BENASSAYAG, H. COFFIN, C. BONAFOS, C. DUMAS, S. M. ATARODI, AND A. CLAVERIE.
Solid State Phenomena Vols, 108-109, pp 71-76, 2005.
J. GRISOLIA, M. SHALCHIAN, G. BENASSAYAG, H. COFFIN, C. BONAFOS, C. DUMAS, S. M. ATARODI, AND A. CLAVERIE.
Solid State Phenomena Vols, 108-109, pp 71-76, 2005.
From continuous to quantized charging phenomena in few nanocrystals MOS structures.
G. Ben Assayag, M. Shalchian, J. Grisolia, C. Bonafos, S. M. Atarodi and A. Claverie.
Solid State Phenomena Vols, 108-109, pp 25-32, 2005.
G. Ben Assayag, M. Shalchian, J. Grisolia, C. Bonafos, S. M. Atarodi and A. Claverie.
Solid State Phenomena Vols, 108-109, pp 25-32, 2005.
From continuous to quantized charging response of silicon nanocrystals obtained by ultra-low energy ion implantation.
M. SHALCHIAN, J. GRISOLIA, G. BEN ASSAYAG, H. COFFIN, A. CLAVERIE,
Solid State Electron, 49, Issue 7, July 2005, 1198-1205
M. SHALCHIAN, J. GRISOLIA, G. BEN ASSAYAG, H. COFFIN, A. CLAVERIE,
Solid State Electron, 49, Issue 7, July 2005, 1198-1205
Nanoimprint process using epoxy-siloxane low-viscosity prepolymer
Benoît Viallet, Pascal Gallo, and Emmanuelle Daran
J. Vac. Sci. Technol. B, 23(1), 72-75 Jan/Feb 2005
Benoît Viallet, Pascal Gallo, and Emmanuelle Daran
J. Vac. Sci. Technol. B, 23(1), 72-75 Jan/Feb 2005
Oxidation effects on transport characteristics of nanoscale MOS capacitors with an embedded layer of silicon nanocrystals obtained by low energy ion implantation
J. GRISOLIA, M. SHALCHIAN, G. BENASSAYAG, H. COFFIN, C. BONAFOS, S. SCHAMM, S. M. ATARODI, AND A. CLAVERIE.
Materials Science and Engineering B, 124-125 (2005) 494-498.
J. GRISOLIA, M. SHALCHIAN, G. BENASSAYAG, H. COFFIN, C. BONAFOS, S. SCHAMM, S. M. ATARODI, AND A. CLAVERIE.
Materials Science and Engineering B, 124-125 (2005) 494-498.
Room-temperature quantum effect in silicon nanoparticles obtained by low-energy ion implantation and embedded in a nanometer scale capacitor
M. SHALCHIAN, J. GRISOLIA, G. BEN ASSAYAG, H. COFFIN, S. M. ATARODI, AND A.CLAVERIE
Appl. Phys. Lett., 86, 163111, (2005).
M. SHALCHIAN, J. GRISOLIA, G. BEN ASSAYAG, H. COFFIN, S. M. ATARODI, AND A.CLAVERIE
Appl. Phys. Lett., 86, 163111, (2005).
The effects of oxidation conditions on structural and electrical properties of silicon nanoparticles obtained by ultra-low energy ion implantation
J. GRISOLIA, M. SHALCHIAN, G. BENASSAYAG, H. COFFIN, C. BONAFOS, S. SCHAMM, S. M. ATARODI, AND A. CLAVERIE.
Nanotechnology, 16 (2005) 2987-2992.
J. GRISOLIA, M. SHALCHIAN, G. BENASSAYAG, H. COFFIN, C. BONAFOS, S. SCHAMM, S. M. ATARODI, AND A. CLAVERIE.
Nanotechnology, 16 (2005) 2987-2992.
2004
Atomic force microscopy study of micrometric pattern replica by hot embossing lithography
C. Martin, L. Ressier, JP. Peyrade
Microelectronic Engineering, 71, 272-276 (2004)
C. Martin, L. Ressier, JP. Peyrade
Microelectronic Engineering, 71, 272-276 (2004)
Elaboration of 1µm square arrays of octadecyltrimethoxysilane monolayers on SiO2/Si by combining chemical vapour deposition and nano-imprint lithography
J.-B. Lhuillier, C. Martin, L. Ressier, J.-P. Peyrade, M. Respaud, J.Grisolia
Superlattices and Microstructures, 36, 227 (2004)
J.-B. Lhuillier, C. Martin, L. Ressier, J.-P. Peyrade, M. Respaud, J.Grisolia
Superlattices and Microstructures, 36, 227 (2004)
Fabrication of nanodevices for magneto-transport measurements through nanoparticles
C. Martin, J. Grisolia, L. Ressier, M. Respaud, J. P. Peyrade, F. Carcenac, C. Vieu
Microelectronic Engineering B, 73-74 (2004) 627-631
C. Martin, J. Grisolia, L. Ressier, M. Respaud, J. P. Peyrade, F. Carcenac, C. Vieu
Microelectronic Engineering B, 73-74 (2004) 627-631
Injection of vacancies at metal grain boundaries during the oxidation of nickel
S. Perusin, B. Viguier, D. Monceau, L. Ressier et E. Andrieu
Acta Materiala, , 52, 5375-5380 (2004)
S. Perusin, B. Viguier, D. Monceau, L. Ressier et E. Andrieu
Acta Materiala, , 52, 5375-5380 (2004)
MOCVD processed platinium – aluminium coatings on titanium alloys
M. Delmas, M. Ucar, L. Ressier, M. Pons et C. Vahlas
Surface & Coatings Technology,, 188-189, 49-54 (2004)
M. Delmas, M. Ucar, L. Ressier, M. Pons et C. Vahlas
Surface & Coatings Technology,, 188-189, 49-54 (2004)
Patterning of sub-micrometric Co/NiO dots by hot embossing lithography and study of their magnetic properties.
J. GRISOLIA, C. MARTIN, L. RESSIER, F. CARCENAC, C. VIEU, J-F. BOBO, J-P. PEYRADE
Journal of Magnetism and Magnetic Materials, 272-276, e1293-e1295 (2004)
J. GRISOLIA, C. MARTIN, L. RESSIER, F. CARCENAC, C. VIEU, J-F. BOBO, J-P. PEYRADE
Journal of Magnetism and Magnetic Materials, 272-276, e1293-e1295 (2004)
Self-organization of CoRh nanoparticles on chemical nanopatterns
C. Martin, D. Zitoun, L. Ressier, F. Carcenac, O.Margeat, C. Amiens, B. Chaudret, M. Respaud, J.-P. Peyrade, C. Vieu
Journal of Magnetism and Magnetic Materials, 272-276, e1363-e1365 (2004)
C. Martin, D. Zitoun, L. Ressier, F. Carcenac, O.Margeat, C. Amiens, B. Chaudret, M. Respaud, J.-P. Peyrade, C. Vieu
Journal of Magnetism and Magnetic Materials, 272-276, e1363-e1365 (2004)
Study of PMMA recoveries on micrometric patterns replicated by nano-imprint lithography
C. Martin, L. Ressier, J-P Peyrade,
Physica E, 17 (2 3) 523-525
C. Martin, L. Ressier, J-P Peyrade,
Physica E, 17 (2 3) 523-525
2003
Effects of ultraviolet ozone treatment on benzocyclobutene films
B. Viallet, Emmanuelle Daran, and Laurent Malaquin
J. Vac. Sci. Technol. A, 21,3, 766-771 2003
B. Viallet, Emmanuelle Daran, and Laurent Malaquin
J. Vac. Sci. Technol. A, 21,3, 766-771 2003
Elaboration process of nanodevices for magneto-transport measurement through magnetic nanoparticles
J. Grisolia, C. Martin, L. Ressier, M. Respaud, J-P. Peyrade, F. Carcenac, C. Vieu, D. Zitoun, O.Margeat, C.Amiens, B.Chaudret
-, 12th European Workshop on Heterostructure Technology, HETECH-03, 12-15 October 2003, Madrid, Spain.
J. Grisolia, C. Martin, L. Ressier, M. Respaud, J-P. Peyrade, F. Carcenac, C. Vieu, D. Zitoun, O.Margeat, C.Amiens, B.Chaudret
-, 12th European Workshop on Heterostructure Technology, HETECH-03, 12-15 October 2003, Madrid, Spain.
2002
Growth mechanism of cavities in MeV helium implanted silicon.
J. GRISOLIA, S. GODEY, E. NTSOENZOK, F. LABHOM, A. VAN VEEN, BEN ASSAYAG G., CLAVERIE A.
J. APPL. PHYS., Vol n°91, n°11, p.9027-9030, 1 June 2002.
J. GRISOLIA, S. GODEY, E. NTSOENZOK, F. LABHOM, A. VAN VEEN, BEN ASSAYAG G., CLAVERIE A.
J. APPL. PHYS., Vol n°91, n°11, p.9027-9030, 1 June 2002.
Permalloy thin films on MgO (001) : Epitaxial growth and physical properties
F. Michelini, L. Ressier, J. Degauque, P. Baule, A. R. Fert, J. P. Peyrade, and J. F. Bobo
J. APPL. PHYS., Volume 92, Number 12 15 December 2002
F. Michelini, L. Ressier, J. Degauque, P. Baule, A. R. Fert, J. P. Peyrade, and J. F. Bobo
J. APPL. PHYS., Volume 92, Number 12 15 December 2002
2001
The generic nature of the Smart-Cut® process for thin film transfer
B. Aspar, H. Moriceau, E. Jalaguier, C.Lagahe, A.Soubie, B.Biasse, A.M. Papon, A.Claverie, J.Grisolia, G.Ben Assayag, F. Letertre, O. Rayssac, T. Barge, C. Maleville, B.Ghyselen.
Journal of Electronic materials, vol. 30, N°7, 2001.
B. Aspar, H. Moriceau, E. Jalaguier, C.Lagahe, A.Soubie, B.Biasse, A.M. Papon, A.Claverie, J.Grisolia, G.Ben Assayag, F. Letertre, O. Rayssac, T. Barge, C. Maleville, B.Ghyselen.
Journal of Electronic materials, vol. 30, N°7, 2001.
2000
A TEM quantitative study of the growth of hydrogen platelets in silicon.
J. GRISOLIA, LAGAHE C., ASPAR B., BEN ASSAYAG G., CLAVERIE A.
Appl. Phys. Lett., Vol76, No7, p.852-854, 2000
J. GRISOLIA, LAGAHE C., ASPAR B., BEN ASSAYAG G., CLAVERIE A.
Appl. Phys. Lett., Vol76, No7, p.852-854, 2000
Kinetic aspects of the growth of hydrogen induced platelets in SiC.
J. GRISOLIA, F. CRISTIANO, B. DE MAUDUIT, F. LETERTRE, ASPAR B., DI CIOCCIO L., BEN ASSAYAG G., CLAVERIE A.
J. APPL. PHYS., Vol n°87, n°12, p.8415-8419, 15 June 2000
J. GRISOLIA, F. CRISTIANO, B. DE MAUDUIT, F. LETERTRE, ASPAR B., DI CIOCCIO L., BEN ASSAYAG G., CLAVERIE A.
J. APPL. PHYS., Vol n°87, n°12, p.8415-8419, 15 June 2000
“Formation energies and relative stability of perfect and faulted dislocation loops in Silicon.”
F. Cristiano, Grisolia J., B.Colombeau, M.Omri, B. de Mauduit, F. Giles, N.E.B. Cowern, A. Claverie.
J. APPL. PHYS., vol n°87, n°12, p.8420-8428, 15 June 2000.
F. Cristiano, Grisolia J., B.Colombeau, M.Omri, B. de Mauduit, F. Giles, N.E.B. Cowern, A. Claverie.
J. APPL. PHYS., vol n°87, n°12, p.8420-8428, 15 June 2000.
1999
“Nitrogen implantation in 4H and 6H-SiC.”
Gimbert J., Billon T., Ouisse T., Grisolia J., Ben Assayag G., Jaussaud C.,
Materials Science and Engineering B, 1999, vol 61-2, pp 368-372.
Gimbert J., Billon T., Ouisse T., Grisolia J., Ben Assayag G., Jaussaud C.,
Materials Science and Engineering B, 1999, vol 61-2, pp 368-372.
2010
Numerical simulations for a quantitative analysis of AFM electrostatic nanopatterning of PMMA by Kelvin Force Microscopy
E. Palleau, L. Ressier, Ł Borowik et L. T. Mélin
Nanotechnology 21, 225706-225713 (2010)
E. Palleau, L. Ressier, Ł Borowik et L. T. Mélin
Nanotechnology 21, 225706-225713 (2010)
Tunable pyramidal assemblies of nanoparticles by convective/capillary deposition on hydrophilic patterns made by AFM oxidation lithography
B. Viallet, L. Ressier, L. Czornomaz et N. Decorde
Langmuir 26 (7), 4631-4634 (2010)
B. Viallet, L. Ressier, L. Czornomaz et N. Decorde
Langmuir 26 (7), 4631-4634 (2010)
