Laboratoire de Physique et Chimie de Nano-Objets
Institut National des Sciences Appliquées
135 avenue de Rangueil, 31077 TOULOUSE CEDEX 4 - FRANCE
Tél : 00 33 05 61 55 96 51 | Fax : (+33) (0)5 61 55 96 97
135 avenue de Rangueil, 31077 TOULOUSE CEDEX 4 - FRANCE
Tél : 00 33 05 61 55 96 51 | Fax : (+33) (0)5 61 55 96 97
Accueil du site > LPCNO > Publications > Articles > 2005 > The effects of oxidation conditions on structural and electrical properties of silicon nanoparticles obtained by ultra-low energy ion implantation
J. GRISOLIA, M. SHALCHIAN, G. BENASSAYAG, H. COFFIN, C. BONAFOS, S. SCHAMM, S. M. ATARODI, AND A. CLAVERIE.
The effects of oxidation conditions on structural and electrical properties of silicon nanoparticles obtained by ultra-low energy ion implantation
Nanotechnology, 16 (2005) 2987-2992.
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